In semiconductor fabrication, a resist is a thin layer used to transfer a circuit pattern to the semiconductor substrate which it is deposited upon. A resist can be patterned via lithography to form a (sub)micrometer-scale, temporary mask that protects selected areas of the underlying substrate during subsequent processing steps. The material used to prepare said thin layer is typically a viscous solution. Resists are generally proprietary mixtures of a polymer or its precursor and other small molecules (e.g. photoacid generators) that have been specially formulated for a given lithography technology. Resists used during photolithography are called photoresists.
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Famous quotes containing the word resist:
“For the mother who has opted to stay home, the question remains: Having perfected her role as a caretaker, can she abdicate control to less practiced individuals? Having put all her identity eggs in one basket, can she hand over the basket freely? Having put aside her own ambitions, can she resist imposing them on her children? And having set one example, can she teach another?”
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